Gallium Enterprises Pty Ltd is a limited by shares, Australian proprietary company. This corporation was registered on 2003-05-15 and was issued with the 104736870 ACN. Its Australian Business Number is 11104736870. Since 2007-12-18, the company is headquartered in NSW, post code 2128. The previous headquarters were located in NSW 2112 (from 2007-09-28 to 2007-12-18), NSW 2109 (from 2005-12-22 to 2007-09-28), and NSW 2109 (from 2005-10-24 to 2005-12-22). Gallium Enterprises Pty Ltd was registered for the GST on 2005-07-01. The above data comes from the ABN database which was updated on 2007-12-19. AUBiz found 3 trademarks that mention this company. Trademark number 1278703 was filed on 2009-01-08 and is categorised as "word" (application status: "registered, live"). Other company trademarks include trademark number 1280225 registered on 2009-01-08 in the "word" category (application status/date: "registered, live", 2009-01-08); and trademark number 1390671 in the "word" category (application status/date: "never registered, live", 2010-10-26).
Status | From | To |
---|---|---|
Active | 2003/05/15 | current |
Name | From | To |
---|---|---|
Gallium Enterprises Pty Ltd | 2006/07/19 | current |
Bluglass Pty Ltd | 2005/04/15 | 2006/07/19 |
Sensitive Light Pty Ltd | 2003/05/15 | 2005/04/15 |
Location | From | To |
---|---|---|
NSW 2128 | 2007/12/18 | current |
NSW 2112 | 2007/09/28 | 2007/12/18 |
NSW 2109 | 2005/12/22 | 2007/09/28 |
NSW 2109 | 2005/10/24 | 2005/12/22 |
NSW 2109 | 2003/05/15 | 2005/10/24 |
Status | From | To |
---|---|---|
Registered | 2005/07/01 | current |
Advertisements
Application date: | 2009/01/08 |
Lodgement date: | 2009/01/08 |
Registered date: | 2009/01/08 |
Live or dead: | Live |
CPI status: | Registered |
Status: | Registered/Protected |
Mark code: | Trade Mark |
Trademark type: | Word |
Acceptance due date: | 2009/04/22 |
Sealing due date: | 2009/11/14 |
Registered from date: | 2009/01/08 |
Sealing date: | 2009/11/10 |
Renewal due date: | 2019/01/08 |
Court orders: | No |
Revocation of the acceptance: | No |
Goods and services assistance: | Yes |
Lodgement type: | AFS |
Descriptive: | Blg-150 |
Examination report number: | 1 |
Examination class count: | 1 |
NICE class code: | 7 |
NICE occ number: | 1 |
NICE description text: | Machines For The Production Of Semiconductors |
Suburb name: | Silverwater |
Postcode: | 2128 |
Australian state code: | NSW |
Country code: | AU |
Application date: | 2009/01/08 |
Lodgement date: | 2009/01/08 |
Registered date: | 2009/01/08 |
Live or dead: | Live |
CPI status: | Registered |
Status: | Registered/Protected |
Mark code: | Trade Mark |
Trademark type: | Word |
Acceptance due date: | 2009/04/22 |
Sealing due date: | 2009/11/14 |
Registered from date: | 2009/01/08 |
Sealing date: | 2009/11/10 |
Renewal due date: | 2019/01/08 |
Court orders: | No |
Revocation of the acceptance: | No |
Goods and services assistance: | Yes |
Lodgement type: | Online |
Descriptive: | Blg-300 |
Examination report number: | 1 |
Examination class count: | 1 |
NICE class code: | 7 |
NICE occ number: | 1 |
NICE description text: | Machines For The Production Of Semiconductors |
Suburb name: | Silverwater |
Postcode: | 2128 |
Australian state code: | NSW |
Country code: | AU |
Application date: | 2010/10/26 |
Lodgement date: | 2010/10/26 |
Live or dead: | Live |
CPI status: | Never Registered |
Status: | Lapsed/Not Protected |
Mark code: | Trade Mark |
Trademark type: | Word |
Acceptance due date: | 2012/05/24 |
Court orders: | No |
Revocation of the acceptance: | No |
Goods and services assistance: | Yes |
Lodgement type: | Online |
Descriptive: | Epiblu |
Examination report number: | 1 |
Examination class count: | 1 |
NICE class code: | 7 |
NICE occ number: | 1 |
NICE description text: | Machines For The Production Of Semiconductors |
Suburb name: | Silverwater |
Postcode: | 2128 |
Australian state code: | NSW |
Country code: | AU |
General information:
Patent status: |
Sealed What happens 3 months after acceptance, assuming there are no oppositions filed. The Status 'sealed' was replaced with 'granted' with IP reform implementation, but from a systems perspective the two statuses are identical. |
Patent type: | NPE |
International Patent Classification:
IPC Mark: | H01L 21/205 |
Section code: | H - electricity |
Class code: | 1 - basic electric elements |
Subclass code: | L - semiconductor devices; electric solid state devices not otherwise provided for (use of semiconductor devices for measuring g01; resistors in general h01c; magnets, inductors, transformers h01f; capacitors in general h01g; electrolytic devices h01g0009000000; batteries, accumulators h01m; waveguides, resonators, or lines of the waveguide type h01p; line connectors, current collectors h01r; stimulated-emission devices h01s; electromechanical resonators h03h; loudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers h04r; electric light sources in general h05b; printed circuits, hybrid circuits, casings or constructional details of electrical apparatus, manufacture of assemblages of electrical components h05k; use of semiconductor devices in circuits having a particular application, see the subclass for the application); |
Main group code: | 21 - processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof |
Subgroup code: | 205 - using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition |
IP Australia process information:
Expiry date: | 2023/05/19 |
General information:
Patent status: |
Sealed What happens 3 months after acceptance, assuming there are no oppositions filed. The Status 'sealed' was replaced with 'granted' with IP reform implementation, but from a systems perspective the two statuses are identical. |
Patent type: | NPE |
International Patent Classification:
IPC Mark: | H01L 21/205 |
Section code: | H - electricity |
Class code: | 1 - basic electric elements |
Subclass code: | L - semiconductor devices; electric solid state devices not otherwise provided for (use of semiconductor devices for measuring g01; resistors in general h01c; magnets, inductors, transformers h01f; capacitors in general h01g; electrolytic devices h01g0009000000; batteries, accumulators h01m; waveguides, resonators, or lines of the waveguide type h01p; line connectors, current collectors h01r; stimulated-emission devices h01s; electromechanical resonators h03h; loudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers h04r; electric light sources in general h05b; printed circuits, hybrid circuits, casings or constructional details of electrical apparatus, manufacture of assemblages of electrical components h05k; use of semiconductor devices in circuits having a particular application, see the subclass for the application); |
Main group code: | 21 - processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof |
Subgroup code: | 205 - using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition |
IP Australia process information:
Expiry date: | 2025/09/27 |
General information:
Patent status: |
Accepted Found to have no further lawful grounds of objection by the examiner. For innovation patents, acceptance is automatic following payment of fees. |
Patent type: | NPE |
International Patent Classification:
IPC Mark: | C23C 16/52 |
Section code: | C - chemistrymetallurgy |
Class code: | 23 - coating metallic material; coating material with metallic material; chemical surface treatment; diffusion treatment of metallic material; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; inhibiting corrosion of metallic material or incrustation in general |
Subclass code: | C - coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general (applying liquids or other fluent materials to surfaces in general b05; making metal-coated products by extrusion b21c0023220000; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. b21d0039000000, b23k; working of metal by the action of a high concentration of electric current on a workpiece using an electrode b23h; metallising of glass c03c; metallising mortars, concrete, artificial stone, ceramics or natural stone c04b0041000000; paints, varnishes, lacquers c09d; enamelling of, or applying a vitreous layer to, metals c23d; inhibiting corrosion of metallic material or incrustation in general c23f; treating metal surfaces or coating of metals by electrolysis or electrophoresis c25d, c25f; single-crystal film growth c30b; by metallising textiles d06m0011830000; decorating textiles by locally metallising d06q0001040000; details of scanning-probe apparatus, in general g01q; manufacture of semiconductor devices h01l; manufacture of printed circuits h05k) |
Main group code: | 16 - chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (reactive sputtering or vacuum evaporation c23c0014000000) |
Subgroup code: | 52 - controlling or regulating the coating process (controlling or regulating in general g05) |
IP Australia process information:
Expiry date: | 2033/07/15 |
Contains public sector information licensed under the Creative Commons Attribution 3.0 Australia licence. Material on this website was obtained from publicly-accessible databases and is attributed to ©Commonwealth of Australia 2024 (http://data.gov.au, http://acnc.gov.au/ and http://abr.business.gov.au/), ©Intellectual Property Government Open Data 2024, ©ASIC - Company Register. While we try to make the information as precise and up-to-date as possible, we are aware the datasets are not always error-free. Aubiz.net will not take responsibility for any errors in the databases. The material provided should be treated as a starting point of more in-depth research, not as fact.